Macquarie Semiconductor and Technology on behalf of Macquarie Semiconductor and Technology Inc. (MSTI)
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Metal CVD (Chemical Vapor Deposition)
Date of Manufacture: 1994-01-12
Currently Configured for: 200mm
Current Equipment Status: Available
Location of Equipment: Haltom City, United States
Available date: Currently Available
Software: b6.02
MF: P5000 Mark II
Qty 2 - WxZ: WSiX Deposition
Chuck: Anodized Aluminum
MFCs: 12 Horiba Digital MFCs
Robot: ROBOT ASSY 8 IN AMAT 5000
Dry Pumps:
1 Edwards IXH620, 1IQD80/QMB250 stack, 1 IQDP80
Chillers:
AMAT Heatex 1, Neslab HX150
Delatech CDO abatement qty2
Upgrades:
V440 SBC
Power glitch protection
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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