Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (VA)

Applied Materials (AMAT) Reflexion LK - Poly/STI

Asset ID: 206026

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Applied Materials (AMAT)

Reflexion LK - Poly/STI

Poly/STI CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Manassas, United States

Available date: Currently Available

Currently Configured for 300mm wafer size

MFG Date: 2005

EQUIPMENT DETAILS:

Tool Status: Deinstalled and moved to the warehouse.

Configuration: Audit to verify.

CMP 6-3AMAT_REFL_POLY AMAT REFL POLY


OEM                                 AMAT

Tool Model                      Reflexion LK

Process                             POLY

Software Version            lp384.8_52

                                           208v 3 Ø 60Hz

Loading Configuration    3 load ports (TDK)


System Configuration Description:


1 Polisher – 3 platens

2 Polisher – 4 carriers (contour)

3 Polisher – 8 UPAs (G4+)

4 Polisher – P1 slurry controllers: 50-500ml/min (x2)

5 Polisher – P2 slurry controllers: 50-500ml/min (x2)

6 Polisher – P3 slurry controllers: 50-500ml/min (x2)

7 Cleaner – Running Beam

8 Cleaner – Input, Buffer, Megasonics, Brush Box 1, Brush Box 2, Dryer (Desica – Marangoni)


Missing Parts:


Description                                                                                                Missing (qty)

ASSY, POLISHER DC POWER SUPPLY (AMAT: 0010-63313)                          1



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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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