Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
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PECVD (Chemical Vapor Deposition)
Date of Manufacture: 2006-01-01
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan, Taiwan
Available date: Currently Available
Tool config is based on original PO, please verify tool details at tool inspection
OEM: AMAT
Tool Model: PRSE
Software Version (include revision #): pmB5.4_135
System Power Rating: 110 AC 3-Phase for System
Loading Configuration: 2 LP/8 cooling station/ 25 wafer FOUP
Chamber Name 1: CHA
Chamber Name 2: CHB
Chamber Name 3: CHC
Chamber 1 Description: (XE) PE SILANE TWIN
Chamber 2 Description: (XE) PE SILANE TWIN
Chamber 3 Description: (XE) PE SILANE TWIN
Chamber 1 Chemicals Gases Used: SIH4 LO/SIH4/NH3/N2/NF3/AR/HE/N2O HI/N2O LO
Chamber 2 Chemicals Gases Used: SIH4 LO/SIH4/NH3/N2/NF3/AR/HE/N2O HI/N2O LO
Chamber 3 Chemicals Gases Used: SIH4 LO/SIH4/NH3/N2/NF3/AR/HE/N2O HI/N2O LO
OEM Cable 1: EMO cable
OEM Cable 2: HX water pipe
OEM Cable 3: Device net/Pump signal
OEM Cable Length 1: 2250
OEM Cable Length 2: 2250
OEM Cable Length 3: 2250
Optional Gas 1: SiH4_Hi - 2000
Optional Gas 2: SiH4_Lo - 500
Optional Gas 3: EMPTY
Optional Gas 4: NH3 - 700
Optional Gas 6: NF3 - 5000
Optional Gas 8: Ar - 10000
Optional Gas 9: N2 - 25000
Optional Gas 11: N2O_Lo - 2000
Optional Gas 12: N2O_Hi - 15000
Optional Gas 14: HE - 15000
Damage/Missing parts list
Please inspect tool to reconfirm
Dry pumps and customer provided items not included on sales
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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