Macquarie Semiconductor and Technology on behalf of Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V. for its Fraunhofer-Institut fur Mikroelektronische Schaltungen und Systeme IMS
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PECVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 200mm
Current Equipment Status: Available
Location of Equipment: Duisburg, Germany
Available date: Currently Available
***Macquarie will manage the deinstallation, rigging, and crating at Buyer’s expense. Quotes for these services will be provided to buyer following tool award, or upon request.***
Shipping is the full responsibility of the buyer using their selected vendor, however transportation/shipping quotes are also available upon request.
ESTIMATED REMOVAL COSTS:
DEINTALLATION: $20,872,50
RIGGING: $15,977.33
WAREHOUSE HANDLING: $3,497.33
CRATING: $11,508.71
FINAL COSTS MAY BE DIFFERENT AND WILL BE BASED ON ACTUAL COSTS.
The system was bought through a broker in 2008 refurbished by Point35
Manufacture / Supplier:
Applied Materials
Serial Number:
Applied Materials Project Number 4070
Dimension [mm] (width/depth/height):
Tool: 2000 / 1400 / 2150
Generator Rack: 1330 / 800 / 1850
Weight abb. [kg]:
Tool : >1000 kg
Mainframe: P5000
Chamber A: TEOS PECVD (C-Chuck)
Chamber B: TEOS PECVD (C-Chuck)
Chamber C: MXP+ Oxid Etch (ceramic E-Chuck)
Chamber D: MXP+ Oxid Etch (ceramic E-Chuck)
Gasbox:
Chamber A: C2F6, NF3, O2, He, TMP, TMB, TEOS
Chamber B: C2F6, NF3, O2, He, TMP, TMB, TEOS
Chamber C: N2, O2, SF6, CF4, CHF3, Ar
Chamber D: N2, O2, SF6, CF4, CHF3, Ar
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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