Macquarie Semiconductor and Technology on behalf of Inspire Technologies, Inc.

Estek Automation SDN BHD WIS-600B

Asset ID: 210689

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Estek Automation SDN BHD

WIS-600B

Broadband Patterned Wafer Defect Inspection

Metrology Equipment

Equipment details:

Date of Manufacture: 1987

Currently Configured for: 200mm

Current Equipment Status: Available

Location of Equipment: Caldwell, United States

Available date: Currently Available

Estek WIS 600


Designed to completely analyze substrates, films and oxides used in the manufacture of semiconductors. Dark and light channel system. Dark channel is used for detecting particles and any light scattering defects. Light channel is useful for detecting non-light scattering defects such as mounds, dimples and non uniformity. Detects specular flaws, including large particles, mounds, dimples, saw marks, grooves, fractures, slip, epi-spikes, small particles on large grained surfaces, particles buried in/under a film. Detection 0.30 um or .20 um(optional) on Silicon at 95% capture rate. Verified by NIST Traceable Standards. Remanufactured system to factory production specifications.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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