Macquarie Semiconductor and Technology on behalf of Macquarie (Asia) Pte Ltd. Taiwan Branch - UMC
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: 1995
Currently Configured for: 200mm
Current Equipment Status: Available
Location of Equipment: Hsinchu 300, Taiwan
Available date: Currently Available
Inspect to confirm configuration and condition.
The system is not on-line.
Install Type is Stand-Alone.
The equipment is suitable for processes of oxide, SiN, silicon, metal etch.
The gas used contains O2, N2, CHF3, SF6.
The pump is Lyebold (Model: D25BCS) and will be move out with the equipment.
The chiller is NESLAB (model: CFT75) that the current status is damaged and it will be move out with the equipment.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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