Macquarie Semiconductor and Technology on behalf of Qorvo US, Inc.
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Surface Technology Systems (STS)
Etch/Ash/Clean - Plasma Processing
Date of Manufacture:
Currently Configured for: 150mm
Current Equipment Status: Available
Location of Equipment: Greensboro, United States
Available date: Currently Available
EQUIPMENT RAN GaAs MATERIAL.
ICP-3 – C081 – Plasma kit
Operator Station software version 13.07
Brooks VCE6 dual load lock with VTR5 robot – model# 001-7600-02
2x Ebara A25S pumps
3 chamber system – 160mm platens, lip seal/mechanical clamp
ENI ACG10B, 1KW coil generator
ENI-ACG3B 300 W platen generator
Chamber 3 and 4 w/ stand-alone gas boxes.
Argon – 50sccm
O2 – 50sccm
Cl2 – 200sccm
BCL3 – 200sccm
N2 – 100sccm
N2 – 100sccm
MKS653B throttle valve and 600 series pressure controller w/VAT isolation valve
MAG900CT turbo pumps – Magdrive 1000 controllers
Ebara ESR20N-HT backing pumps
Chamber 2
Version 2 chamber with onboard gas box.
ENI ACG10B, 1KW coil generator – Balun coil
ENI-ACG3B 300 W platen generator
Argon – 50sccm
O2 – 50sccm
Cl2 – 200sccm
BCL3 – 200sccm
N2 – 100sccm
VAT 65046 DN200 throttle valve w/ VAT PM7 pressure controller
MAG1500 turbo pump – 400020V0002 – Mag Drive Digital controllers
Ebara ESR20N-HT backing pump
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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