Macquarie Semiconductor and Technology on behalf of Qorvo US, Inc.

Scia Systems GmbH Magna 200

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Asset ID: 205000

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Scia Systems GmbH

Magna 200

PVD (Physical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 2021-02-01

Currently Configured for: 200mm

Current Equipment Status: Available

Location of Equipment: Richardson, United States

Available date: Currently Available

Custom-built Scia Magna 200 Inline Off-Axis system for depositing Aluminum Nitride at an angle to achieve specific Resonance Frequencies. 


Scia has offered to provide Installation Services at the Buyer Facility.


Highlights:

  • Scia offered to support Installation at Buyer
  • Configured for 150mm wafer production
  • Deposition Rate > 200 Å/min
  • NU < 1%, WTW NU < .5%
  • RI = 2.1 + 0.05
  • XRD AlN pole figure c-axis tilt angle = 33 + 4 degrees
  • Vacuum 5 x 10-8 mbar


Configuration Specs

  • Substrate Heating
  • Carrier for Round Substrates
  • Heating for Seed Layer
  • In-Situ Optical Thickness Measurement
  • SEC II/GEM Interface
Item ComponentDimensionsWeight
1Heat Exchanger w/ Lines57L x 32W x 55H470
2Cryo Compressor w/Lines39L x 32W x 49H486
3Stair Step/ Side Panels/ Carrier Trays59L x 40W x 55H515
4System Rack48L x 36W x 105H948
5Equipment Rack63L x 45W x 105H1963
6Main Body139L x 80W x 90H7330
7Load Station65L x 62W x 76H2351


Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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