Macquarie Semiconductor and Technology on behalf of Intel Resale Corporation
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Concept Three Altus Max ICEFill
WCVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Portland, United States
Available date: Currently Available
· 2x FOUP Loadports
· Mini-Environment (Front End)
· Atmospheric Robot
· Wafer Transfer Module (WTS)
· User Interface: screen & computer
· Light Tower
· 2x Loadlocks
· 2x Loadlock Cooling Pedestals
· 4x Showerheads (subject to availability) x2
· Al Heater Pedestals with lift pins (station 1) x2
· Al Heater Pedestals (stations 2-4) x2
· Pneumatic Spindle x2
· RF Generator x2
· RF Match x2
· Endpoint Controller x2
· Gas Box x2
· ICE-rp Pedestal
· ICE-rp Sapphire lift pins
· ICE-rp Showerhead
· ICE-rp RF matcher
· ICE-rp RF Generator
· Local Power Box x3
· Additional details available upon request
§ Note Tool Box /Trolley PC/Monitor not part of tool
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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