Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Producer GT+ PECVD Silane

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Asset ID: 232694

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Applied Materials (AMAT)

Producer GT+ PECVD Silane

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 2014-05-01

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available


Description:

MiCAP Number1214113
Section 1: Tool General Information
Micron MISTI/LID #MSPRK48300
Vendor Tool Serial #429825
Date of Tool Move-In
Tool Excess Date12/02/2027
Tool Current StatusIn Production
Tool LocationCleanroom
Any modification/ conversion/ refrofit was perform to the tool?No
Any defective or missing partsNo
Section 2: Tool Specific Information
OEMAMAT
Tool ModelProducer GT +
Software Version (include revision #)
System Power Rating
Loading Configuration
Tool under OEM service contract?
Indicate all modification/conversion/retrofit parts and high cost part replacement history (e.g robots, ESC, Heaters, etc)
Part TypePart DescriptionPart numberDate of ChangeQtyRemark
1NA
2
3
For multi-chms system, please indicate the chamber type of individual chm, do not use Micron Proprietary names for Chemical/Gases
(Section is also application to tank configuration for Wet bench)
Chamber DescriptionChamber Chemicals Gases Used
Chamber AHASSiH4, NH3, NF3, N20, Ar, He, N2
Chamber BHASSiH4, NH3, NF3, N20, Ar, He, N2
Chamber CHASSiH4, NH3, NF3, N20, Ar, He, N2


Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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