Macquarie Semiconductor and Technology on behalf of Intel Resale Corporation
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PECVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Chandler, United States
Available date: Currently Available
PLEASE NOTE THAT THIS TOOL/CHAMBER CONFIG IS COMPLETELY UNIQUE TO INTEL
Ø 2 Twin Chambers
o 2 Remote Plasma Units in each Twin Chamber
o 2 Showerheads and Baffles in each Twin Chamber
o 2 heater plates that rotate while processing
o 2 Rotating Pedestals
· Aluminum Top Liner that surrounds the pedestal and isolates the chamber body
· Aluminum Pumping Ring that serves as a pumping channel to pumping port
· Edge Ring that prevents deposition of by-products on the ped sidewall
o 2 Pedestal Lifts
o 1 Lift Pin
Ø Single TSA Line that splits into 2 and delivers to both showerheads
Ø Manometer Tree
Ø Foreline
Ø Iso and Throttle Valve
Ø Bento Ozone Batch Curing Chamber
o 6 wafer slots
o Mounted on the side of the FI
Ø Single Axis Aligner
Ø Sub Fab Ozone Generator
Ø 22 Stick Gas Boxes
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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