Macquarie Semiconductor and Technology on behalf of Intel Resale Corporation
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PECVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Portland, United States
Available date: Currently Available
· 2x FOUP Loadports
· Mini-Environment (Front End)
· Atmospheric Robot
· User Interface: screen & computer
· Light Tower
· 2x Loadlocks
· 2x Loadlock Cooling Pedestals
· 2x Linear Transfer Modules
· 4x Showerheads (subject to availability)
· Al Heater Pedestals with lift pins (station 1)
· Al Heater Pedestals (stations 2-4)
· Pneumatic Spindle
· Integrated Liquid Delivery System
· Low Frequency RF Generator
· High Frequency RF Generator
· RF Match
· Endpoint Controller
· Gas Box
· Local Power Box
· 3x Super Input / Output Controller
· Additional details available upon request· 2x FOUP Loadports
· Mini-Environment (Front End)
· Atmospheric Robot
· User Interface: screen & computer
· Light Tower
· 2x Loadlocks
· 2x Loadlock Cooling Pedestals
· 2x Linear Transfer Modules
· 4x Showerheads (subject to availability)
· Al Heater Pedestals with lift pins (station 1)
· Al Heater Pedestals (stations 2-4)
· Pneumatic Spindle
· Integrated Liquid Delivery System
· Low Frequency RF Generator
· High Frequency RF Generator
· RF Match
· Endpoint Controller
· Gas Box
· Local Power Box
· 3x Super Input / Output Controller
· Additional details available upon request
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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