Macquarie Semiconductor and Technology on behalf of Intel Resale Corporation

Lam Research / Novellus Systems Inc. SABRE Extreme

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Asset ID: 232691

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Lam Research / Novellus Systems Inc.

SABRE Extreme

ECD (Electro Chemical Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 2022-01-01

Currently Configured for: 300mm

Current Equipment Status: Incoming

Asset HDD not included

Location of Equipment: Chandler, United States

Available date: Currently Available


Description:

Lam Research / Novellus Systems Inc. SABRE Extreme

(aka SABRE I12 ELECTROPLATER, 300mm, i12 Frame)


Tool never used and HDD may possibly be included, subject to seller's approval


Packing list unavailable


Tool is crated in warehouse with no photos available including S/N tag photo


Module

Details

Fixloader

N2 Loadport

Control PC’s

2 proteus PC’s, Chase & main

FFU

SABRE FFU and SABRE ANL FFU - Pentagon

Front End Robot

Vortex

Back End Robot

Vortex

 

 

Anneal Chambers

5 chambers Gas Box Hot Plate Cold Plate

Carrier arm (Fork carrier)

Aligner Station

Optical Aligner- Vortex

Transfer Station

Transfer Station

Plating Cell

Sabre Extreme plating cell

Anode chamber

High-Acid anode chamber Charge plate

Membrane

High-Acid membrane

HRVA

Domed HRVA (non cu); HRVA (cu)

Insert

Insert is in cell, mounted above HRVA

Clamshell

Modular clamshell drive

Cone

Cone

Cylinder

Dry cylinder

Cup

Cup assembly (1.5mm)

Lift Controller

IAI Lift controller

AAE

AAE assy’s - Cel1, Cell 2/3 Robot Motor Controller Bearings

 

 

PEM

Front side treatment:

O-ring style PEM chuck EBR arm nozzle

PEM controllers PEM motor spindles

 

Dosing system

Dosing system hardware and controls; Dosing control

Dosing system PNL NOWPAK Dosing system kit

 

CDM Module

CDM module, Syringe controllers. Flow switches & Valves; Chem Dilution Mod Assy

CDM module plumbing kit CDM sensor kit

Bath Module

PS Reservoir Assy Ultrasonic Level Sensor

PVDF Heat Exchanger/ Dual PVDF Heat Exchangers for newer tools or upgrades

Plating Pumps

Plating pump

Flow meters - Vortex

Invertor (50Hz)

Frequency invertor used where applicable

Aspirator Pump

Selectable Drain Aspirator

Heater/ Chiller

TF10000

 

 

 

ESIOCs

ESIOC’s;

Wafer Handler Bath

Plating Post-plating

Anneal SAC

EC2 Controllers

1x System controller 2x Module controllers

E -Net

2 E-net hubs and cabling setup

PDA

Plating distribution assembly

AE PPS

Dual channel power supply: E-Wave II

Additional high configuration details, below are included:

i12 configuration

Extreme cells

Lifts (X-SEL) and tilts (ROBO Cyl)

IPA spin controllers

PEM's are the same as EPN except for the deflector shields are for Non-Cu style

CDM tanks but not used, due to the PRIZE (FST) configuration

PSD4 syringe pumps

Extreme plating cells

Vortex wet and dry robot

AE E-WAVE PS

EC2 controllers

Anneals, but not used for Non-Cu

DI/filter compartment is similar to the FX, but w/out SAC O2

Facilities panel is similar to the FX

DI booster pump

AC 10 cell pump controllers similar to EPN

Levitronix SAC pump similar to FX

Anneal shroud similar to FX

Front end (mini environment) folding side door access to anneals and FE robot, similar to FX

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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