Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
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Date of Manufacture: 2014
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan City, Taiwan
Available date: Currently Available
Process: BACKETCH
Tool config is based on original PO, please verify tool details at tool inspection
Process: SWC_300HF Processes
Sending Site Workstation Name: SWC_300HF_EOS
Software Version (include revision #): 1.84-SP9-SC8-HF6-Release
System Power Rating: 208AC 3-phase for System
Chm/Unit Position 1: process chamber- 300:1DHF, DICO2, N2, IPA
Chm/Unit Position 2: cabinet- IPA, 300:1DHF, CDA, N2, DICO2, DIW
Chm/Unit Position 3: DICO2 module- CO2, DIW, CDA
Chm/Unit Position 4: Chiller- PCW, DHF
Base System
Front End Robot.: Vortex
Process Robot: Vortex Qty 2
Host Controller: Host Interface
Product Type: EOS GS L
Wafer Mapping capability: E84 Parallel I/O Sensors
System software
PC Version: OUI software
Main Controller: System software
Host Controller: Host Software
FOUP Station
FOUP: 300mm FOUP
Load Port: Number of FOUP
Process Module 1-16: Lam
ACID Cabinet ICDS1: (80 liters on EOS),DHF,20L for 100:1 HF (80 liters on EOS)
ACID Cabinet ICDS2: (80 liters on EOS) ,5L for IPA Yes
ACID Cabinet ICDS3: (80 liters on EOS),DHF,20L for 100:1 HF Heat Exchanger
ACID Cabinet ICDS4: (80 liters on EOS) ,5L for IPA
Exhaust Control: Acid Exhaust
DIW System: From Tool Main Frame ,Dispense 4 DIW
Gas System: From Tool Main Frame, N2
Gas System: From Tool Main Frame, CDA
Process Module 1-16: Acid Exhaust line Yes
Process Module 1-16: Alkali Exhaust line Yes
"Fire Extinguisher: Required for IPA
dry(set)繹寶 "
DICO2 module: mixing DIW and CO2
Chiller: PCW to control chemical timperature
CCTV box: local
Cooling system: Cooling DHF system
Safety Precautions: LOTO Independent lockout device for each chemical and gas line for maintenance
Facilities: Chemical Line Connection Rear Bottom (C.S.S.)
Facilities: Electrical Supply Option for transformer(208 to 400V).
N2 Load Port Exists: No
Chemical Mixing and Supply
Supply line
Line 1: DHF
Line 2: IPA
Line 3: SC1
Setting Ratio: MML mixing
DHF: 1:300/1:100
IPA: recipe set
DIW: RT
Flow rates
DHF: 2000ml/min ,1500 ml/min (needle valve controlled)
DI: 1500 ml/min(needle valve controlled)
IPA: 100~145 ml/min
Damage/Missing parts list
Please inspect tool to reconfirm
Dry pumps and customer provided items not included on sales
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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