Macquarie Equipment Trading on behalf of Micron Technology Taiwan, Inc. (F11)

P.S.K. Tech Inc. Tigma N

Asset ID: 87793

Print spec sheet

P.S.K. Tech Inc.

Tigma N

Stripper/Asher

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2014

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

Process: STRIP


From original tool PO, please inspect to verify


Base System

Platform Type: TIGMA N

Main System EFEM Robot: Sankyo(SR8240 Grip)

Main System TM Robot: Sankyo(SR8250)

End Effectors: Black Alumina (CH10)

Main Controller: System Controller

Host Controller: Host Interface

USB Port: Capable of recipe storage and retrieval

Hard Disk Type: SATA2

UPS on system: Comply to SEMI F47

Earth Leakage Breaker: Yes

Monitor: Front and rear touch screen

Computer Keyboard: Front and rear touch screen

Signal Tower: Red/Yellow/Blue/Green


System software

Software Version: 1.96

OS Type: Windows XP

Main Controller: System software

Host Controller: Host Software

Micron host interface: TAS 2.0.4 compliant


User interface

USB Port: Yes

Data Viewer: Yes

AMHS: TAS 2.0.4 compliant

E84 to host: TAS 2.0.4 compliant

GEM SEC Revision: TAS 2.0.4 compliant


System software

Binary Recipe Download: Ability for customer host to download recipes

Recipe format: Supplier to provide binary or hex format of recipes.

Parallel processing: Enabled

Antivirus Capability: Yes, run in background


FOUP Station

Wafer Size and Shape: Notch (SEMI Standard) Wafer Diameter : 300 +/- 0.25mm

FOUP: 300mm FOUP

Wafer Pitch: Semi Standard

Load Port: Number of FOUP

Wafer Mapping capability: E84 Parallel I/O Sensors

Wafer Mapping capability: E99 Carrier ID Reader

Wafer Mapping capability: RF tag readers


Chamber 1 (PM 1)

Chamber: (2 stage/chamber)

Plasma Source, Power Range: FCIP (1 - 6KW) - R3 sourcefor PM 1

Quartz chamber vessel: Quartz

Quartz view port: Chamber side wall

Quartz baffle plate: Al6061 T6

Dual Process Vessels: Two per chamber

Heater Block,Temprature Range: 90 -300C

End Point Detection: 309nm filter type

Slit Door: VAT

Gas Box: -

MFC Channel 1: PM1/2/3: O2 (15SLM)

MFC Channel 2: PM1/2/3: N2 (10SLM)

MFC Channel 3: PM1/2/3: H2N2 (10SLM)

MFC Channel 4: -

Pressure (ATM to VAC): MKS: 0 - 1000Torr, side of chamber wall

Baratron: MKS: 0 - 10Torr, side of chamber wall

Auto Leak Check SVID: Yes

Temperature Controller: PID control


Chamber 2 (PM 2)

Chamber: (2 stage/chamber)

Plasma Source, Power Range: FCIP (1 - 6KW) - R3 source for PM 2

Quartz chamber vessel: Quartz

Quartz view port: Chamber side wall

Quartz baffle plate: Al6061 T6

Dual Process Vessels: Two per chamber

Heater Block,Temprature Range: 90 -300C


Chamber 1 (PM 1)

End Point Detection: 309nm filter type


Chamber 2 (PM 2)

Slit Door: VAT

Gas Box: -

MFC Channel 1: PM1/2/3: O2 (15SLM)

MFC Channel 2: PM1/2/3: N2 (10SLM)

MFC Channel 3: PM1/2/3: H2N2 (10SLM)

MFC Channel 4: -

Pressure (ATM to VAC): MKS: 0 - 1000Torr, side of chamber wall

Baratron: MKS: 0 - 10Torr, side of chamber wall

Auto Leak Check SVID: Yes

Temperature Controller: PID control


Chamber 3 (PM 3)

Plasma Source, Power Range: FCIP (1 - 6KW) - R3 source for PM 3

Quartz chamber vessel: Quartz

Quartz view port: Chamber side wall

Quartz baffle plate: Al6061 T6

Dual Process Vessels: Two per chamber

Heater Block,Temprature Range: 90 -300C

End Point Detection: 309nm filter type

Slit Door: VAT

Gas Box: -

MFC Channel 1: PM1/2/3: O2 (15SLM)

MFC Channel 2: PM1/2/3: N2 (10SLM)

MFC Channel 3: PM1/2/3: H2N2 (10SLM)

MFC Channel 4: -

Pressure (ATM to VAC): MKS: 0 - 1000Torr, side of chamber wall

Baratron: MKS: 0 - 10Torr, side of chamber wall

Auto Leak Check SVID: Yes


Facilities

Exhaust Interface: Bottom

Utility Box: Regulator: FujiKin

Utility Box: Manual Valve : Yes

Utility Box: Pressure Gauge : 0 - 100PSI

sub-panel: 2 sub units

Interconnect Cables: Power and signal (80feet)

Pump to TCU: 25m

TCU to PM: 25m

PM to Pump Interconnect: 25m

Proces Chamber Pump Interface: RS232, EBARA ESR300W


Supporting Remote Units

RF Generator Source: FCIP R3 

RF Source Cable 18 Feet: FCIP R3

RF matcher: FCIP R3


Damage/Missing parts list

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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