Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
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Metal CVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Configuration for chambers: Please see below.
|Vendor Chm Model||Chemicals / Gases|
|Chm/Unit Position 1||EXII_TiN||TiCl4,NH3,ClF3,N2|
|Chm/Unit Position 2||EXII_TiN||TiCl4,NH3,ClF3,N2|
|Chm/Unit Position 3||EXII_TiN||TiCl4,NH3,ClF3,N2|
|Chm/Unit Position 4||EXII_TiN||TiCl4,NH3,ClF3,N2|
Configuration for others: Will be provided by Fab15.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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