Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. (TEL) Telius 305 DRM

Asset ID: 208660

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Tokyo Electron Ltd. (TEL)

Telius 305 DRM

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: June 27, 2003

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

DRY ETCH 15-3TEL_TLUDRM_OX_02 TEL TLUDRM OX


Equipment is located in Micron’s cleanroom and is schedule for deinstallation by the OEM. Buyer is responsible for $29,972.34 in de-installation including equipment rigging costs payable to Micron. Buyer is also responsible for packaging, crating, loading and shipping

The OEM's shipping kits' cost is not included.


De-installation by the OEM has been scheduled, starting on June 29, 2021.

Equipment will be shipped from Fab15 to an off-site warehouse on July 17, 2021.


No missing or damaged parts reported by Fab15.



[Chamber A]

Chamber type:DRM

Gas config. (sccm)=FCS full scale

 2line(advanced radical distribution control)

 Ar(754)/C4F8(43)/O2(46.8)/O2(1215)

 CF4(336)/CHF3(163)/CH2F2(144)/N2(300)

 CHF3(25.1)/O2(18.7)/N2(30)/CH2F2(14.4)

RF 13.56MHz, max 5000W

Temp Top +30~+80℃

     Wall +40~+80℃

     ESC -10~+60℃


[Chamber A]

Chamber type:DRM

Gas config. (sccm)=FCS full scale

 2line(advanced radical distribution control)

 Ar(754)/C4F8(43)/O2(46.8)/O2(1215)

 CF4(336)/CHF3(163)/CH2F2(144)/N2(300)

 CHF3(25.1)/O2(18.7)/N2(30)/CH2F2(14.4)

RF 13.56MHz, max 5000W

Temp Top +30~+80℃

     Wall +40~+80℃

     ESC -10~+60℃

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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