Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Applied Materials (AMAT) Reflexion LK Oxide

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Asset ID: 209659

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Applied Materials (AMAT)

Reflexion LK Oxide

Dielectric CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2024-01-01

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

Tool config is based on original PO, please verify tool details at tool inspection


OEM: AMAT

Tool Model: REFLEXION LK

Software Version (include revision #): lp3B4.5_29

System Power Rating: AC208V 3-Phase

Loading Configuration: 3 load port

Retrofit Part Type 1: HPMJ

Retrofit Part Description 1: High Pressure Micro Jet Cleaning System

Retrofit Date of Change 1: 07/23/2015 16:00:00

Retrofit Qty 1: 1

Chamber Name 1: NA

N2 Load Port Exists 1: No

N2 Load Port Exists 2: No

Optional Gas 1: NA


Damage/Missing parts list

Missing- Platen Iron plate cover lose Qty 3

Missing- SLURRY SINGLE MANIFOLD Qty 2

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales

Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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