Macquarie Semiconductor and Technology on behalf of Inspire Technologies, Inc.
Date of Manufacture: 1987
Currently Configured for: 200mm
Current Equipment Status: Available
Location of Equipment: Caldwell, United States
Available date: Currently Available
Estek WIS 600
Designed to completely analyze substrates, films and oxides used in the manufacture of semiconductors. Dark and light channel system. Dark channel is used for detecting particles and any light scattering defects. Light channel is useful for detecting non-light scattering defects such as mounds, dimples and non uniformity. Detects specular flaws, including large particles, mounds, dimples, saw marks, grooves, fractures, slip, epi-spikes, small particles on large grained surfaces, particles buried in/under a film. Detection 0.30 um or .20 um(optional) on Silicon at 95% capture rate. Verified by NIST Traceable Standards. Remanufactured system to factory production specifications.
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