Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Dainippon Screen Mfg. Co. (DNS) FC-3100

Asset ID: 19307

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Dainippon Screen Mfg. Co. (DNS)

FC-3100

Batch Wafer Processing

Etch/Clean - Wet Processing

Equipment details:

Date of Manufacture: 2007

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available


Process: LTD


Tool config is based on original PO, please verify tool details at tool inspection


Bath-1: SPM

LFR: Quartz

Bath: Quartz

Mixing Ratio: Empty


Bath-2: HQDR

LFR: Z (QZ)

Bath: Quartz

Temp.: Facility

Heater: Facility

Drain Define: WD2 & WD3


Bath-3: SC1 (M/S)

LFR: Z (QZ)

Bath: Quartz

Temp.:60C

Mixing Ratio: SC1 2:3:100; SC1 1:1:125

Pump: FW-40T2-07

Heater: Lamp heater

Filter: 0.05um

Megasonic: U01200PMCA

Conc. Monitor: CS-15MF-11-115A-QU

Drain Define: SC1: WD2; Diluted SC1: WD2

Other:Flow meter for all chemical


Bath-4: ONB

LFR: Z (QZ)

Bath: Quartz

Temp.:RT~65C

Mixing Ratio: HF 1:500

Heater: Facility

Conc. Monitor: HF-960M

Drain Define: SC1 Clean:WD2; DIW:WD3 ; HF:WD1

Other:Flow meter for all chemical


Bath-5: LPD

LFR: PVDF

Bath: PVC

Temp.:~30C

Drain Define: Dilted chemical:WD2; DIW:WD3; IPA:WD7


Damage/Missing parts list

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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