Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
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Date of Manufacture: 2008-01-11
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
|Process||Clean(Plasma Bevel Etcher)|
|Software Version (include revision #)||Ver.1.8.4|
|System Power Rating||200 AC 3-Phase for System|
|Loading Configuration||3 Load Port|
|Vendor Chm Model||Chemicals / Gases Used (not to use Micron Proprietary names)|
|Chm/Unit Position 1||Clean(Plasma Bevel Etcher)||N2/O2/Ar/CF4/SF6|
|Chm/Unit Position 2||Clean(Plasma Bevel Etcher)||N2/O2/Ar/CF4/SF6|
|Chm/Unit Position 3||Clean(Plasma Bevel Etcher)||N2/O2/Ar/CF4/SF6|
|Description||LP, ATM, VTM, AL, PM1/2/3, RPDB|
|MFC/Pressure Unit:||STEC SEC-Z313[N2(200), O2(1000), CF4(200), Ar(500), SF6(200)]|
|Drive Mechanisms:||Brooks製ATM robot / Brooks製MagnaTran7|
|FOUP Opener:||Brooks製Load Port|
|Gas System:||Onborad gas line|
Missing or damaged parts: Looks like some parts are missing. Fab15 is checking now.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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