Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Producer SE APF

Asset ID: 207743

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Applied Materials (AMAT)

Producer SE APF

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

CVD 15-3AMAT_PRODSE2_ACW AMAT


A Hard Disk Drive will be removed from tool.

Other missing or damaged parts: Not reported.


[Chamber A]

Chamber Type:APF

Gas Config(sccm)=MFC Full Scale

C3H6(3000)/NF3(1000)/O2(15000)/AR(10000)/HE(5000)/O2(10000)/Ar(10000)/N2(15000)/He(1000)

RF HF  13.56MHz, max 3kW

Remote plasma 400kHz,max 10kW


[Chamber B]

Chamber Type:APF

Gas Config(sccm)=MFC Full Scale

C3H6(3000)/NF3(1000)/O2(15000)/AR(10000)/HE(5000)/O2(10000)/Ar(10000)/N2(15000)/He(1000)

RF HF  13.56MHz, max 3kW

Remote plasma 400kHz,max 10kW



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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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