Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Tokyo Electron Ltd. (TEL) CLEAN TRACK LITHIUS

Asset ID: 5947

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Tokyo Electron Ltd. (TEL)

CLEAN TRACK LITHIUS

Multi Block (Resist Coater/Developer)

Resist Processing Equipment

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: 10/29/2021

•300mm
•2005 vintage
•4x FOUP (25 wafers)
•Left to Right
•High speed IBFM
•4x Coat Modules
oRGEN02 pumps (4ml type)
o7x resist nozzles
oResist temp control
oTop side EBR
oRRC pre wet
•4x Develop Modules
o1 SH nozzle
oTop side rinse
oDevelop temp control
•2x ADH
•4x HCP (high speed CPL)
•4x LHP (low hot plate)
•9x CPHP (chilling high precision hot plate)
•2x WCPL (water chilling plate)
•1x IHCP
•1x CWH (cup wash holder)
•1x BWEE
•2x TRS
•2x Cup T&H control units
•1x Develop External chemical box
•ASML interface

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