Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Ushio UMA-2003

Asset ID: 13755

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UV Cure System

Resist Processing Equipment

Equipment details:

Date of Manufacture: 2014

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: 6/4/2021

Model: UMA-2003-H120F

Model: UMA-2003-H120F-IM01
Process: 6500-35 GATE RESIST CURE

Basic System: UMA-2003-H120F UVC, Qty 1
Wafer Size: Capable of processing 300mm +/- 0.05mm (SEMI M28), 775 +/- 25um, notched wafers, Qty 1
Carrier: 2 FOUP, Qty 1(TDK TAS-300)
Interface: 2 FOUP (Continuous flow operation). With Semi compliant MENV and FIMS assemblies
Carrier ID: Bar code, Qty 2
Communications Protocol: HSMS, Qty 1
EMO: Display and Main Unit (including attached Mini-environment) have front and back EMO, LAMP POWERSUPPLY UNIT FRONT SIDE, Qty 4
Interlocks: Power Supply Unit and Mini-environment have panel (cover) interlocks. Open lamp house
Cable Lengths: 15 meter cables run between the main unit and the Lamp?Supply unit, Qty 1
Signal Tower: Red/Yellow/Green, Qty 1
CL plate: Hp on the CL plate(with vacuum), Qty 1
Detection sensor(port1,port2): The FOUP up and down a transmission sensor Installation, Qty1
ROBOT?Controller?Unit: Qty 1
Bulk Gas: CDA Peak Flow=280, Ave Flow=5.4, Static pressure0.5?0.6M??
Bulk Gas: N2?FLOW10?50????n, Static pressure0.5?0.6Mpa
Bulk Gas: Vacuum?-80???,Flow?40L/Min
Electric: 200V±10V? 3PH 50/60Hz?175A? for Tool
Electric: 200V±10V? 3PH 50/60Hz?33A? for Chiller Unit
Water supply: Temperature?10?25? Flow? 6L/Min(over) Pressure?0.5?0.6Mpa for tools
Water supply: Temperature?25?(following), Flow?60L/Min(over), Pressure?.1Mpa(over)for Chiller unit
Exhaust: 6m3/min
Lamp cooling?20m3/min
Lamp power supply Exhaust?7m3/min Qty 3

Missing/Damaged Parts List
None report, please inspect tool to reconfirm

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