Macquarie Semiconductor and Technology on behalf of Micron Technology Utah, LLC
PVD (Physical Vapor Deposition)
Date of Manufacture: 2017
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Lehi, United States
Available date: Currently Available
| Vendor Tool Serial # | ME16-9603 | ||||
| Date of Tool Move-In | 1-Jun-17 | ||||
| Tool Model | Entron EX | ||||
| Process | MATY | ||||
| Software Version | v357-15 | ||||
| System Power Rating | AC208V 3φ 50/60Hz | ||||
| Loading Configuration | 3 Load Ports | ||||
| Description | Chemicals / Gases Used | ||||
| Chm/Unit Position F1 | Normal - Carbon | Carbon | Ar | ||
| Chm/Unit Position F4 | Normal - Carbon | Carbon | Ar | ||
| Chm/Unit Position R1 | Normal - Carbon Nitride | Carbon | Ar, N2 | ||
| Chm/Unit Position R2 | RF - MATY | MATY | Ar | ||
| Chm/Unit Position R3 | RF - MATY | MATY | Ar | ||
| Chm/Unit Position R4 | Normal - Carbon | Carbon | Ar | ||
| Chm/Unit Position B1 | Degas | N/A | |||
| Chm/Unit Position B2 | Degas | N/A | |||
| Chm/Unit Position LLA | Load Lock | N2 | |||
| Chm/Unit Position LLB | Load Lock | N2 | |||
| Tool Frame with 2 RF Sputter Ch, 4 Normal Sputter Ch, 2 Degas Ch | |||||
| Legacy EFEM | |||||
| On Board Maintenance Crane | |||||
| MPD Racks x3, Utility Rack x1 | |||||
| RF chambers contaminated with toxics (MATY) | |||||
| H2S fliter on back of EFEM intake | |||||
| Acess ladder added to frame by Fab logistics (isntalled at B1/B2 location) | |||||
| 2nd source KVM installed | |||||
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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