Applied Materials (AMAT) Producer GT Eterna FCVD

Equipment details:

Date of Manufacture: 2015

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

Tool config is based on original PO, please verify tool details at tool inspection

Segregation Requirement: Non Metal

Capable Levels: 4200-20 STI OXIDE DEP

Software Version (include revision #): pmB5.4_135

System Power Rating: 110 AC 3-Phase for System

Loading Configuration: 3 LP/9 cooling station/ 25 wafer FOUP

Chm/Unit Position A: ETERNA TWIN CHM A; Chemicals / Gases Used: NH3_SIDE2/NF3/AR_CLN/O2_LOW/O2_CLN/TSA/HE/NH3_SIDE1/H2O/AR_H2O

Chm/Unit Position B: ETERNA2 UV cure TWIN CHM B; Chemicals / Gases Used: AR_TOP/AR_SH/AR_BTM/NF3/AR_CLN/O3

Chm/Unit Position C: ETERNA TWIN CHM C; Chemicals / Gases Used: NH3_SIDE2/NF3/AR_CLN/O2_LOW/O2_CLN/TSA/HE/NH3_SIDE1/H2O/AR_H2O

Process Unit: FCVD

MFC/Pressure Unit: PSIA

FOUP Opener:Entegris, E99 Carrier RF Tag Reader 

Gas Panel Schematic for FCVD & UV

Fab Support Items (Reference)

1. Heat Exchanger SMC H2000(INR-498-012C) Qty2 

2. Chiller-20 SMC Qty 1

3. TSA/Purge N2/CO2 Cabinet: TSA Qty 2

4.UV AC Rack: AMAT        

5. Regulators box: Taiyo Nippon

6. O3 Generator: AMAT

7. AC BOX: AMAT

8. UV Curing System: AMAT

9. Process Vacuum Pump: Edwards 

10 Scrubber: DAS 

11 Buffer pump: Edwards 

Damage/Missing parts list

missing- Process Vacuum Pump: Edwards IH3000L(Qty:2)

missing-Scrubber: DAS escape Scrubber(Qty:2)

missing-Buffer pump:Edwards IH600L(Qty:1)

missing- TSA Cabin (Trisilylamine) Qty 2

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales