Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Tokyo Electron Ltd. (TEL) Triase+ Ti/TiN

Asset ID: 61884

Print spec sheet

Tokyo Electron Ltd. (TEL)

Triase+ Ti/TiN

Metal CVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: TBC

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

No photos provided by FAb15 since tool has been de-installed and is stored in an off-site warehouse.

Fab15’s shipping kits have been installed on Loader Module/Transfer Module of the tool. The Fab15 shipping kits are required to return to Fab15.


[PM-1]

Process:TiN

Gas(sccm)?

TiCl4(100),ClF3(500),N2(600/2000/600/2000/300),NH3(5000/300/1000),


[PM-2]

Process:Ti

Gas(sccm)?

TiCl4(20),ClF3(500),Ar(2000/300),H2(5000),NH3(600/2000),N2(2000)


[PM-3]

Process:TiN

Gas(sccm)?

TiCl4(100),ClF3(500),N2(600/2000/600/2000/300),NH3(5000/300/1000),


Missing or damaged parts: Not reported. Please inspect to confirm.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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