Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Metal CVD (Chemical Vapor Deposition)
Date of Manufacture: TBC
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
No photos provided by FAb15 since tool has been de-installed and is stored in an off-site warehouse.
Fab15’s shipping kits have been installed on Loader Module/Transfer Module of the tool. The Fab15 shipping kits are required to return to Fab15.
[PM-1]
Process:TiN
Gas(sccm)?
TiCl4(100),ClF3(500),N2(600/2000/600/2000/300),NH3(5000/300/1000),
[PM-2]
Process:Ti
Gas(sccm)?
TiCl4(20),ClF3(500),Ar(2000/300),H2(5000),NH3(600/2000),N2(2000)
[PM-3]
Process:TiN
Gas(sccm)?
TiCl4(100),ClF3(500),N2(600/2000/600/2000/300),NH3(5000/300/1000),
Missing or damaged parts: Not reported. Please inspect to confirm.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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