Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Tokyo Electron Ltd. (TEL) Tactras Vigus


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Asset ID: 12054

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Tokyo Electron Ltd. (TEL)

Tactras Vigus

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2011-01-07

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Tool has been de-installed and is stored in an off-site warehouse.

Fab15 confirmed Six (6) bottom chillers are not included in tool for sale.

Missing or defective parts status: Please see check below.

All chambers are a HARC Chamber.

Tool ModelTactras-Vigus   
Software VersionVer5.05-Rev502-STD-5.05a   
System Power Rating200 AC3-Phase for System   
Loading Configuration3 load port   
Chm/Unit Position   1 Loader Module  
Chm/Unit Position   2 VTM  
Chm/Unit Position   3 Purge storage  
Chm/Unit Position   4, 5, 6, 7, 8, 9 Process Module VIGUS  
Process gases C4F8,C4F6,CH2F2,COS,O2,CHF3,CF4,CO,N2,Ar,He   
Process Unit:Model:   
Controller:EC 1 
MFC/Pressure Unit:FCS Device-net I/F Type (Fujikin)
Drive Mechanisms:Yasukawa LMz軸、R軸、H1軸、H2軸、θACサーボモーター

FOUP Opener:KWF-12C-T1(K-BL-601HAC1-SO-E) 3 
Gas System:1.125 inch Accumulation(CKD)
13 + 3(Edge-Add-Gas)
Exhuast System:TMPTMP-W3503LMC(T4)(VG250)(SHIMADZU)
DescriptionMissing (Qty)Defective (Qty)
Bottom chiller6 

Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.

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