Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Ebara FREX300S Tungsten

Asset ID: 209803

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FREX300S Tungsten

Tungsten CMP

CMP Equipment

Equipment details:

Date of Manufacture: 3/2006

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

Software Version (include revision #) Ver. 11.50  
System Power Rating  208 AC 3-Phase   
Loading Configuration  3 load port  
   Vendor Chm ModelChemicals / Gases Used  
Chm/Unit Position   1  Polish unit slurry Slurry W7300 
Chm/Unit Position   2  Cleaner 1 unitTMAH 0.063% 
Chm/Unit Position   3  Cleaner 2 unitHF 100:1 
Chm/Unit Position   4  Cleaner 3 unitTMAH 0.063% 
Process Unit:  Model:Remark 
PLC  Mitsubishi
Robot Dry  U-RCM9120+XU-ACL4150YASUKAWA1
ME-10/20   Ver. End Point system1
Option chemical  surpass & advance & SMC EBARA cleaner second Chemical line1
MFC/Pressure Unit:     
REGULATOR (Roller pressure)  EV2509-108-FL312697CKD6
E/P REGULATOR (DR pressure)  ITV2020-02-4-X215SMC4
E/P REGULATOR (TR pressure)  ITV2030SMC4
Drive Mechanisms:     
TR Rotation driver  MR-J2S-350BMitsubishi4
TR Swing driver  MR-J2S-200BMitsubishi4
Dr rotation driver  MR-J2S-10BMitsubishi4
Dr swing driver  MR-J2-03B5Mitsubishi4
Turn table driver  SGDH-1AAE-Y291YASUKAWA4
Cleaner roller rotation driver  SGDS-01A32AYASUKAWA6
Cleaner stage rotation driver  SGDS-01A32AYASUKAWA6
CLTP X&Z axis driver  SGDS-02A32AYASUKAWA2
S/D rotation driver  SGDS-10A32AYASUKAWA1
FOUP Opener:     
Gas System:     
Exhuast System:     

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