Macquarie Semiconductor and Technology on behalf of Inspire Technologies, Inc.
Date of Manufacture:
Currently Configured for: To be determined
Current Equipment Status: Available
Location of Equipment: Caldwell, United States
Available date: Currently Available
OEM: Fison Instruments
Model: Plasma Quad XS
Includes Trivac pump AL.Q.E-120-CB55
Third generation quadrupole ICP-MS instrument.
This instrument was introduced in 1996. The primary improvements were that the STE instrument electronics controller of the PQ2 was replaced by commercially available programmable logic controller components. A fully automated torch alignment platform in the X, Y, and Z directions was used and an insertable torch screen could be fitted for use in cool plasma experiments. The vacuum system was all Edward's turbomolecular and rotary pumps and the lens stack was modified for improved sensitivity and background. The quadrupole and quadrupole electronics were redesigned for improved stability and ion transmission, and a dual-mode electron multiplier system in which analog and pulse counting is conducted simultaneously, became available. The physical size of the instrument was reduced to the size of a large table and the noise level reduced dramatically. Instrument sensitivity for a standard PQ3 using standard pneumatic nebulization was in the range of 30-60 mcps/ppm. Using the optional S-option pumping mode, sensitivity could be increased to 150 to 300 mcps/ppm depending on the element. Instrument background was 10 cps at 220 amu.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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