Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
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Etch/Ash/Clean - Plasma Processing
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan, Taiwan
Available date: Currently Available
Tool config is based on original PO, please verify tool details at tool inspection
Tool Model: TACTRAS VESTANV
System Power Rating: 208V AC 3-Phase
Loading Configuration: 4 load ports
Chamber 1: VESTANV, Chamber Chemicals Gases Used: N2, SiCl4, Cl2, HBr, CH2F2, NF3, CHF3, CF4, O2, SF6, Ar
Chamber 2: VESTANV, Chamber Chemicals Gases Used: N2, SiCl4, Cl2, HBr, CH2F2, NF3, CHF3, CF4, O2, SF6, Ar
Chamber 3: RT-3, Chamber Chemicals Gases Used:N2, O2
Chamber 4: RT-3, Chamber Chemicals Gases Used:N2, O2
Chamber 5: VESTANV, Chamber Chemicals Gases Used: N2, SiCl4, Cl2, HBr, CH2F2, NF3, CHF3, CF4, O2, SF6, Ar
Chamber 6: VESTANV, Chamber Chemicals Gases Used: N2, SiCl4, Cl2, HBr, CH2F2, NF3, CHF3, CF4, O2, SF6, Ar
Optional Gas
VESTANV #1: N2, F1600
VESTANV #2: SiCl4, 25sccm
VESTANV #3: Cl2, F300
VESTANV #4: HBr, F2L
VESTANV #5: CH2F2, F100
VESTANV #6: NF3, F300
VESTANV #7: N2, F500
VESTANV #8: CHF3, F500
VESTANV #9: CF4, F500
VESTANV #10: O2, F1050 F50
VESTANV #11: NF3, F2L
VESTANV #12: SF6, F2L F100
VESTANV #13: Ar, F2L F100
VESTANV #14: O2, F20
VESTANV #15: CH2F2, F20
VESTANV #16: NF3, F50
RT-3 #1: N2, F1L
RT-3 #2: O2, F7L
Damage/Missing parts list
Please inspect tool to reconfirm
Dry pumps and customer provided items not included on sales
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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