Macquarie Semiconductor and Technology on behalf of Inspire Technologies, Inc.
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Broadband Patterned Wafer Defect Inspection
Date of Manufacture: 1988-01-01
Currently Configured for: 200mm
Current Equipment Status: Available
Location of Equipment: Caldwell, United States
Available date: Currently Available
DOMESTIC SALE: Only offers from US entities will be considered. Seller will not clear the equipment for export or act as Exporter of Record from the United States.
Wafer Inspection System
The Estek WIS 8000/800 is designed to
analyze substrates, films, and oxides.
FEATURES:
2 to 8 inch setup
Dark and light (dual) channel system
2 Cassette system
SPECIFICATIONS:
Detection 0.22um on silicon at 95% capture rate
Verified by NIST Standards
2 to 8 inch capable with proper setup
Current configuration is 4 to 8 inch
Dark and light channel system
Dark channel is used for detecting particles and any light scattering defects
Light channel is useful for detecting non-light scattering defects such as
mounds, dimples and non uniformity
Detects specular flaws, including large particles, mounds,
dimples, saw marks, grooves, fractures, slip, epi-spikes,
small particles on large grained surfaces, particles buried in/under a film
Remanufactured System to factory production specifications
NIST Calibration
Automatic cassette-to-cassette robotic wafer transport system
Non-contaminating robotic wafer handling system with sorting capability
Wis-8000 model/ includes two random access stages
Wafers per hour, 120
Configured to run Fluoroware PA-72 Series Cassette
Data printer
Color Monitor to display wafers
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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