Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Tokyo Electron Ltd. (TEL) Tactras Vesta

Asset ID: 210314

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Tokyo Electron Ltd. (TEL)

Tactras Vesta

Polysilicon Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: Jun - 2014

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Tool Model  Tactras-Vesta NV
Process  Poly
Software Version (include revision #) Tactras-ECC Ver6.35-Rev501-STD-6.35a
System Power Rating  200 AC 3-Phase for System
Loading Configuration  3 load port
   Vendor Chm ModelChemicals / Gases Used (not to use Micron Proprietary names)
Chm/Unit Position   1  Loder Module- 
Chm/Unit Position   2  VTMN2 
Chm/Unit Position   3  Purge storage 
Chm/Unit Position   4  Process module 1 (Vesta NV)Cl2,HBr,NF3,CF4,O2,SF6,Ar
Chm/Unit Position   5  Process module 2 (Vesta NV)Cl2,HBr,NF3,CF4,O2,SF6,Ar
Chm/Unit Position   6  Process module 3 (RT3)N2,O2 
Chm/Unit Position   7  Process module 4 (RT3)N2,O3 
Chm/Unit Position   8  Process module 5 (Vesta NV)Cl2,HBr,NF3,CF4,O2,SF6,Ar
Chm/Unit Position   9  Process module 6 (Vesta NV)Cl2,HBr,NF3,CF4,O2,SF6,Ar
Process Unit:  Model:
Controller:  EC
MFC/Pressure Unit:  FCS Device-net I/F Type (CKD)
Drive Mechanisms:  Yasukawa LM:Z shaft、R shaftH1 shaftH2 shaftθAC Servomotor
:Y shaft(Slider):AC Servomotor
r shaft,θ shaft:DD
FOUP Opener:   
Gas System:  16 lines
Exhuast System:  TMP(STP-XW3503Y)


Fab15 confirmed there were no missing or damaged parts.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.

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