Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
Date of Manufacture:
Currently Configured for: To be determined
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan, Taiwan
Available date: Currently Available
E. A. FISCHIONE 1010 ION MILL
The 1010®Ion Mill® is fully programmable with two independently adjustable HAD ion sources having a 0-30º milling angle, which permit either rapid milling or more gradual material polishing. Under an automatic gas control the specimen can be rocked or rotated with an optional liquid nitrogen cooled stage and optional automatic termination. The choice of single or dual ion source operation allows milling from either one or both sides of the specimen. The HAD ion sources operate over user selectable ranges of extractor voltage (0.5kV to 6.0 kV) and current (3mA to 8mA), and are capable of producing ion beam currents up to 400 mamps. Typically varying voltage changes the average ion energy while varying current alters the ion flux. With increase in either of them the milling rate would increase.
The summary of specifications of 1010®Ion Mill® is listed below:
The basic procedure of sample preparation and ion milling are:
Sputtering of specimen due to Ion Milling
Hollow Anode Discharge (HAD) Ion Source
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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