Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Producer SE PECVD SILANE

Asset ID: 209919

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Applied Materials (AMAT)

Producer SE PECVD SILANE

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture:

Currently Configured for: To be determined

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 5/6/2022

Tool Model  Producer SE 
Process  Nit 
Software Version (include revision #)  B3.7_64 
System Power Rating  200/208V AC 3-Phase for System 
Loading Configuration  2 load port 
     
   Vendor Chm ModelChemicals / Gases Used
Chm/Unit Position   1   PE SiH4 TWINN2,SiH4,NF3,NH3,Ar,N2O,CO2,He,N2
Chm/Unit Position   2   PE SiH4 TWINN2,SiH4,NF3,NH3,Ar,N2O,CO2,He,N2



The following Missing parts are from the only Chamber B. A photo for a list of missing parts from Chamber B is Available.

Chamber A is complete.

DescriptionMissing (Qty)
RPS GENERATOR, CIP, ASTRON 2L2
CABLE, RESISTOR JUMP, GAS FEED THRU, COM2
LID Fix Screw2
ASSEMBLY, RF FILTER BOX, HIGH TEMP CONN1
DRVR SERVO MOTOR 100W 200V DNET FIRMWARE 1
HARNESS ASSY, DUAL PIN LIFT DRIVE PWR AD1
CNTRL TEMP DUAL 4DIG DSPL RED/GRN 1/16DI2
HF-GEN2
HF-GEN HOSE1
RF FEEDTHROUGH, MFA, RF MATCH, PRODUCER 1
RPS HOSE2
Teflon Insulator1


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