Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

LAM Research 2300 Versys Metal

Asset ID: 211064

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LAM Research

2300 Versys Metal

Metal Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2006

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

System2300 Versys Metal(V2 PLATFORM)
ProcessMetal
Software Version1.8.4-SP8-HF4-Release
Loading Configuration3 loadports
No equipment manuals available.
208AC, 3-phase
Chamber 1, 42300 Microwave Strip, Gases: N2 ,O2
Chamber 2, 32300 Versys Metal, Gases:BCL3 ,CL2, CH4


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