Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Hitachi (Semiconductor) U-7050A

Asset ID: 195211

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Hitachi (Semiconductor)

U-7050A

Metal Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: October 9, 2013

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 6/10/2021



A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.


[Chamber A]

Chamber type:7050 Eching Chamber

Gas config. (sccm)=MFC full scale

 O2(1000)/Ar 96%+CH4 4%(500)/

 Cl2(300)/Ar(1000)/BCl3(300)/O2(200)/

 Cl2(50)/BCl3(50)

MFC Brand: AEJ

RF Top450MHz, max 1000W

RF Btm 400KHz, max 500W

Temp Top +60~+100℃

     Wall +20~+80℃

     ESC +20~+50℃


[Chamber B]

Chamber type:7050 Eching Chamber

Gas config. (sccm)=MFC full scale

 O2(1000)/Ar 96%+CH4 4%(500)/

 Cl2(300)/Ar(1000)/BCl3(300)/O2(200)/

 Cl2(50)/BCl3(50)

MFC Brand: AEJ

RF Top450MHz, max 1000W

RF Btm 400KHz, max 500W

Temp Top +60~+100℃

     Wall +20~+80℃

     ESC +20~+50℃


[Chamber C]

Chamber type:7050 Ashing Chamber

Gas config. (sccm)=MFC full scale

 O2(5000)/H2O(1000)

RF Top13.56MHz, max 2000W

Temp Stage +250℃


[Chamber D]

Chamber type:7050 Ashing Chamber

Gas config. (sccm)=MFC full scale

 O2(5000)/H2O(1000)

RF Top13.56MHz, max 2000W

Temp Stage +250℃


Pictures will be collected.

Other missing or damaged parts: Not reported.

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