Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
HDP CVD (Chemical Vapor Deposition)
Date of Manufacture: 2007
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan, Taiwan
Available date: Currently Available
Tool config is based on original PO, please verify tool details at tool inspection
Process: STI
Software Version: 5.73B78P3
System Power Rating: 208 AC 3-Phase
Loading Configuration: 3load port(Brooks)
Chm Position 1: C3 SPEED MAX LITE CHA; Chemicals / Gases Used: N2,AR,O2,He,SiH4,H2,NF3
Chm Position 2: C3 SPEED MAX LITE CHB; Chemicals / Gases Used: N2,AR,O2,He,SiH4,H2,NF3
Chm Position 3: C3 SPEED MAX LITE CHC; Chemicals / Gases Used: N2,AR,O2,He,SiH4,H2,NF3
Damage/Missing parts list
missing- CHA Process Vacuum Pump ADS1202H
missing-CHB Process Vacuum Pump ADS1202H
missing-CHC Process Vacuum Pump ADS1202H
missing-LL-System Pump BOC Edwards GX600N
missing-DAS escape Scrubber
Please inspect tool to reconfirm
Dry pumps and customer provided items not included on sales
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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