Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials Reflexion - Dielectric

Asset ID: 55278

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Applied Materials

Reflexion - Dielectric

Dielectric CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Tool has been de-installed and is stored in an off-site warehouse.

FI Server is included in tool but A HARD DISK DRIVE IS NOT INCLUDED.

Other missing or damaged parts: Not reported.


[Platen1]

>30inch platen

 (max133rpm)

>4inch pad conditioner

 (DDF3type,30-120rpm)

>slurry line1:D9228

 (max400ml/min)

 (tube pump)

>torque end point system


[Platen2]

>30inch platen

 (max133rpm)

>4inch pad conditioner

 (DDF3type,30-120rpm)

>slurry line1:D9228

 (max400ml/min)

 (tube pump)

>torque end point system


[Platen3]

>30inch platen

 (max133rpm)

>4inch pad conditioner

 (DDF3type,30-120rpm)

>slurry line1:CES333

 (max400ml/min)

 (tube pump)

>torque end point system


Shipping brackets and kits will need to be supplied by buyer.

A Nova Scan 3060 tool is not included in tool.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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