Macquarie Semiconductor and Technology on behalf of Inspire Technologies, Inc.
Date of Manufacture: March 1991
Currently Configured for: 200mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Caldwell, United States
Available date: Currently Available
Estek WIS 850 (WIS 850) - Detection 0.17 um on Silicon at 95% capture rate. Verified by NIST Standards. 2 to 8 inch capable with proper setup. Dark and light channel system. Dark channel is used for detecting particles and any light scattering defects. Light channel is useful for detecting non-light scattering defects such as mounds, dimples and non uniformity. Detects specular flaws, including large particles, mounds, dimples, saw marks, grooves, fractures, slip, epi-spikes, small particles on large grained surfaces, particles buried in/under a film.
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