Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Tokyo Electron Ltd. (TEL) Expedius

Asset ID: 19311

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Tokyo Electron Ltd. (TEL)

Expedius

Batch Wafer Processing

Etch/Clean - Wet Processing

Equipment details:

Date of Manufacture: 2006

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan City, Taiwan

Available date: Currently Available


Process: WNS


Tool config is based on original PO, please verify tool details at tool inspection



Tank: SD2

COLD-DIW

IPA


Tank: POU

COLD-DIW

HOT-DIW

HCL 1:500 1:1000


Tank: SC1(M/S)

COLD-DIW

HOT-DIW

1.SC1 1:4:130

2.2800W MEG


Tank: HQDR(3)

COLD-DIW

HOT-DIW


Tank: H3PO4(2)

COLD-DIW

H3PO4


Tank: HQDR(2)

COLD-DIW

HOT-DIW


Tank: H3PO4(1)

COLD-DIW

H3PO4


Tank:HQDR(1)

COLD-DIW

HOT-DIW


Tank:DHF

COLD-DIW

1.HF 1:25


Damage/Missing parts list

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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