Macquarie Semiconductor and Technology on behalf of Micron Technology Utah, LLC
PVD (Physical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Lehi, United States
Available date: Currently Available
| Software Version | v357-15 | ||
| System Power Rating | AC208V 3φ 50/60Hz | ||
| Loading Configuration | 3 Load Ports | ||
| Any equipment manuals available? Yes / No | Available from Vendor | ||
| Tool under OEM service contract? Yes / No | No | ||
| Chm/Unit Position F1 | Normal - Carbon | ||
| Chm/Unit Position F4 | Normal - Carbon | ||
| Chm/Unit Position R1 | Normal - Carbon Nitride | ||
| Chm/Unit Position R2 | RF - MATY | ||
| Chm/Unit Position R3 | RF - MATY | ||
| Chm/Unit Position R4 | Normal - Carbon | ||
| Chm/Unit Position B1 | Degas | ||
| Chm/Unit Position B2 | Degas | ||
| Chm/Unit Position LLA | Load Lock | ||
| Chm/Unit Position LLB | Load Lock | ||
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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