Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
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Centura AP DPS AdvantEdge G2 Poly - Chamber Only
Etch/Ash/Clean - Plasma Processing
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
One chamber was removed from tool on 2020/December/10. The one chamber has been warehoused since 2020/December/10.
It is plastic-sheet wrapped up and not crated.
|Vendor Chm Model||Chemicals / Gases Used (not to use Micron Proprietary names)|
|Chm/Unit Position 1||Centura G2||HBR/CL2/O2/HE/N2/SF6/CF4/AR|
Please inspect to confirm any missing or damaged parts.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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