Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
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PECVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: 12/8/2023
|Software Version (include revision #)||B3.7_64|
|System Power Rating||200 AC 3-Phase|
|Loading Configuration||2 load port|
|Tool under OEM service contract?||Yes|
|Vendor Chm Model||Chemicals / Gases Used|
|Chm/Unit Position 1||DARC||SiH4, NF3, NH3, Ar, N2O, CO2, He, N2|
|Chm/Unit Position 2||DARC||SiH4, NF3, NH3, Ar, N2O, CO2, He, N2|
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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