Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
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PECVD (Chemical Vapor Deposition)
Date of Manufacture: 2005
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
CVD 15-3AMAT_PRODSE2_ACW AMAT PRODUCER SE2 ACW
Missing parts reported. List of missing parts (PDF version) is available. Please ask your sales person to review.
Seller requires a third party de-installation for tool. Estimated 3rd party de-installation cost for $22,532 USD with the 10% tax. Buyer is required to pay the de-installation cost to Fab15.
FI & Chambers locking kits are required for the tool's removal from Fab15.
| Item1 | Item2 |
| [Chamber
A] Chamber Type:APF Gas Config(sccm)=MFC Full Scale C3H6(3000)/NF3(1000)/O2(15000)/AR(10000)/ HE(5000)/O2(10000)/ AR(10000)/N2(15000)/HE(1000) RF HF 13.56MHz, max 3kW RF RPS 400kHz, max 10kW | [Chamber
B] Chamber Type:APF Gas Config(sccm)=MFC Full Scale C3H6(3000)/NF3(1000)/O2(15000)/AR(10000)/ HE(5000)/O2(10000)/ AR(10000)/N2(15000)/HE(1000) RF HF 13.56MHz, max 3kW RF RPS 400kHz, max 10kW |
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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