Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. UW300Z

Asset ID: 205558

Print spec sheet

Tokyo Electron Ltd.

UW300Z

Batch Wafer Processing

Etch/Clean - Wet Processing

Equipment details:

Date of Manufacture:

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Tool has been de-installed and is stored in an off-site warehouse.


A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.

No pictures provided: Please inspect to collect photos.


[Bath 1]

NO EXIST / REMOVED


[Bath 2]

 HOT DIW rinse(75deg,40l/min)

 Bath material :Quartz

 Chuck material :Quatrz

 Megasonic :2400W


[Bath 3]

 DHF(1:500)(20deg,15l/min)

 Bath material :PTFE

 Chuck material :PCTFE


[Bath 4]

 Cold DIW rinse(25deg,40l/min)

 Bath material :Quartz

 Chuck material :PCTFE

 Megasonic :2400W


[Bath 5]

NO EXIST / REMOVED


[Bath 6]

 Cold DIW rinse(25deg,40l/min)

 Bath material :Quartz

 Chuck material :PCTFE

 Megasonic :2400W


DRYER1

 type SD2

 IPA/N2 200deg

 100l/min


Other missing parts: Bath 1 and Bath 5 units are missing.

Damaged parts: Not reported.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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