Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Tokyo Electron Ltd. (TEL) Tactras Vesta

Asset ID: 52667

Print spec sheet

Tokyo Electron Ltd. (TEL)

Tactras Vesta

Polysilicon Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: March 20, 2014

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

Tool config is based on original PO, please verify tool details at tool inspection


Tool Model: VESTANV4

Process: POLY

System Power Rating: 208 VAC

Loading Configuration: 3 load port


Chm/Unit Position 1: VESTANV4; Chemicals / Gases Used: HBr, CH2F2, NF3, SF6

Chm/Unit Position 2: VESTANV4:Chemicals / Gases Used: HBr, CH2F2, NF3, SF6

Chm/Unit Position 3: RT3

Chm/Unit Position 4: RT3

Chm/Unit Position 5: VESTANV4; Chemicals / Gases Used: HBr, CH2F2, NF3, SF6

Chm/Unit Position 6: VESTANV4; Chemicals / Gases Used: HBr, CH2F2, NF3, SF6


Damage/Missing parts list

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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