Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Centura AP DPS AdvantEdge G2 Metal

Asset ID: 195178

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Applied Materials (AMAT)

Centura AP DPS AdvantEdge G2 Metal

Metal Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture:

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 3/3/2023




[Chamber A]

Chamber type:AdvantEdgeG2

Gas config.(sccm)=MFC full scale

BCL3(200)/CL2(200)/O2(50)/N2(50)/

SF6(300)/CHF3(50)/CF4(200)/AR(400)

Source 13.56MHz, max 3000 W

Bias 13.56MHz Hz, max 1500 W

Lid Temp Control ~95℃

ESC Temp Control ~85℃


[Chamber B]

Chamber type:AdvantEdgeG2

Gas config.(sccm)=MFC full scale

BCL3(200)/CL2(200)/O2(50)/N2(50)/

SF6(300)/CHF3(50)/CF4(200)/AR(400)

Source 13.56MHz, max 3000 W

Bias 13.56MHz Hz, max 1500 W

Lid Temp Control ~95℃

ESC Temp Control ~85℃


[Chamber C]

Chamber type:ASP

Gas config.(sccm)=MFC full scale

CF4(50)/O2(10000)/N2(1000)

H2O Vapor 3000sccm

Power max 3000 W


[Chamber D]

Chamber type:ASP

Gas config.(sccm)=MFC full scale

CF4(50)/O2(10000)/N2(1000)

H2O Vapor 3000sccm

Power max 3000 W



Missing or damaged parts: Fab15 confirmed there are no missing or damaged parts.

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