Macquarie Semiconductor and Technology on behalf of Qorvo Oregon, Inc.

PVA TePla America, Inc. M4L

Asset ID: 209133

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PVA TePla America, Inc.

M4L

Plasma Cleaner

Cleaning

Equipment details:

Date of Manufacture:

Currently Configured for: N/A

Current Equipment Status: Available

Location of Equipment: Bend, United States

Available date: Currently Available


M4L RF Gas Plasma System Feature

  • Controller: Windows® O/S based touch screen interface offering fully automatic control.
  • Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided.
  • Chamber: 9″ X 13″ X 20″ Aluminum, with high-conductance KF 40 port and isolation valve. Optional throttle valve available.
  • Electrode options include 3-shelf, 5-shelf, and cage electrodes.
  • RF Generator: 300 or 600 watt 13.56 MHz air cooled with automatic impedance matching network.
  • Display: Color 10.4 inch touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.
  • Two user specified gases, with 500 sccm MFCs standard, Optional 3rd gas channel available.
  • Power Requirements: 120- 240 volts, 1ø, 50/60 Hz 30 amps maximum, changeable in the field.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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