Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

LAM Research 2300 Coronus

Asset ID: 210281

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LAM Research

2300 Coronus

Wafer Edge Cleaning - Plasma

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2008. 11

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 11/4/2022

OEM  LAM Research
Tool Model  2300CORO
Process  Clean(Plasma Bevel Etcher)
Software Version (include revision #) Ver.1.8.4
System Power Rating  200 AC 3-Phase for System
Loading Configuration  3 Load Port
   Vendor Chm ModelChemicals / Gases Used (not to use Micron Proprietary names)
Chm/Unit Position   1  Clean(Plasma Bevel Etcher)N2/O2/Ar/CF4/SF6
Chm/Unit Position   2  Clean(Plasma Bevel Etcher)N2/O2/Ar/CF4/SF6
Chm/Unit Position   3  Clean(Plasma Bevel Etcher)N2/O2/Ar/CF4/SF6
DescriptionLP, ATM, VTM, AL, PM1/2/3, RPDB 
Tool:WLAMK6VD00  
Process Unit:PM1/2/3 Model:2300CORO
Controller:NA  
MFC/Pressure Unit:STEC SEC-Z313[N2(200), O2(1000), CF4(200), Ar(500), SF6(200)]
Drive Mechanisms:BrooksATM robot / BrooksMagnaTran7
FOUP Opener:BrooksLoad Port  
Gas System:Onborad gas line  
Exhuast System:NA  
Process Modules
Load Port
ATM
VTM
RPDB


Fab15 confirmed there were no missing or damaged parts.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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